Cover image for Fundamentals of electrochemical deposition
Fundamentals of electrochemical deposition
Paunovic, Milan.
Personal Author:
Publication Information:
New York : Wiley, [1998]

Physical Description:
viii, 301 pages : illustrations ; 25 cm.
General Note:
"Sponsored by the Electrochemical Society, Inc."

"A Wiley-Interscience publication."
Subject Term:
Added Corporate Author:
Format :


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Material Type
Home Location
Central Library TS670 .P29 1998 Adult Non-Fiction Non-Fiction Area

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It would be difficult to overstate the importance of electrochemical deposition to science and technology in the late twentieth century. If not for modern electrochemical deposition methods developed over the past decade and a half, many of today's technological wonders simply would never have been. From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition now plays a crucial role in an array of key industries. And, if the recent shift from physical to electrochemical techniques in microcircuit manufacturing is any indication, its importance will only continue to grow in the years ahead.

This book offers a wide-ranging, authoritative look at state-of-the-art electrochemical deposition theory and practice. Written by an author team with extensive experience in both industry and academe, it provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology. Over the course of 18 independent chapters, Drs. Paunovic and Schlesinger present detailed coverage of the full range of electrochemical deposition processes and technologies, including:
* Metal-solution interphase
* Charge transfer across an interphase
* Formation of an equilibrium electrode potential
* Nucleation and growth of thin films
* Kinetics and mechanisms of electrodeposition
* Electroless deposition
* In situ characterization of deposition processes
* Structure and properties of deposits
* Multilayered and composite thin films
* Interdiffusion in thin film.

Fundamentals of Electrochemical Deposition is an ideal graduate-level textbook for students of electrochemistry and related areas. It is also an indispensable working resource for all professionals who use this technology, including platers and metal finishers.

Fundamentals of Electrochemical Deposition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. With the help of examples drawn from a wide range of areas, the authors describe the science and technology behind all electrodeposition methods currently used in industry. Emphasizing the practical concerns of professionals who use this technology, they provide detailed coverage of:
* nIonic solutions, metal surfaces, and metal-solution interphases
* Electrode potential, deposition kinetics, and thin film nucleation
* Electroless and displacement type depositions
* Effects of additives and the science and technology of alloy deposition
* Current distribution during deposition
* In situ and ex situ deposit characterization
* Mathematical modeling in electrochemistry
* Structure, properties of deposits, multilayers, and interdiffusion.

Author Notes

MILAN PAUNOVIC, PhD, is a researcher with IBM's T. J. Watson Research Center in Yorktown Heights, New York.

MORDECHAY SCHLESINGER, PhD, is a professor in the Department of Physics, University of Windsor, Ontario, Canada.

Reviews 1

Choice Review

Electrochemical deposition is the process by which metals are deposited onto a solid surface by passage of an electric current through the substrate. A common application is electroplating of a variety of metals--for example, gold, silver, or platinum--onto cheaper metal supports. In fact, electrodeposition methods are widely used in a variety of applications. This new edition (1st ed., CH, Apr'99, 36-4509) presents the theoretical underpinnings for the electrodeposition process. The book is a definitive treatment of the subject by two experts in the field, Paunovic (formerly, IBM, New York) and Schlesinger (Univ. of Windsor, Ontario), and it is published under the auspices of The Electrochemical Society, the leading professional organization for this field. It will be of most interest to libraries at institutions where electrochemical research is being carried out at the graduate level. ^BSumming Up: Recommended. Graduate students; faculty; professionals. A. Fry Wesleyan University

Table of Contents

Preface to the Second Edition
Preface to the First Edition
1 Overview
2 Water and Ionic Solutions
3 Metals and Metal Sufaces
4 Metal-Solution Interphase
5 Equilibrium Electrode Potential
6 Kinetics and Mechanism of Electrodeposition
7 Nucleation and Growth Models
8 Electroless Deposition
9 Displacement Deposition
10 Effect of Additives
11 Electrodeposition of Alloys
12 Metal Deposit and Current Distribution
13 Characterization of metallic Surfaces and Thin Films
14 In Situ Characterization of Deposition
15 Mathematical Modeling in Electrochemistry
16 Structure anad Properties of Deposits
17 Electrodeposited Multilayers
18 Interdiffusion in Thin Films
19 Applications in Semiconductors Technology
20 Applications in the Fields of Magnetism and Microelectronics
21 Frontiers in Applications: Applications in the Field of Medicine

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